AURORA, Ill., Oct. 20, 2010 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing ...
ChEmpower Corp., a semiconductor materials company that develops polishing pads and chemical solutions, today announced Chakra, its first product designed to improve efficiency, reduce costs and ...
Electronic and computer processors with a higher speed need smaller features for integrated circuits (IC), which also need smoother and smaller substrate surfaces. Chemical mechanical polishing (CMP) ...
Today, ChEmpower, a leader in semiconductor process innovation, announced Chakra™, a family of functional polishing pads, beginning with the Copper Series, designed specifically for abrasive-free ...
SAN FRANCISCO--(BUSINESS WIRE)--SEMICON West, Booth #6656 North – 3M™, the world’s leading supplier of chemical mechanical planarization (CMP) Pad Conditioners, announces the completion of a major ...
Qnity, DuPont's Electronics business, a premier technology solutions leader across the semiconductor value chain, announced the signing of a Memorandum of Understanding (MOU) with SK hynix, ...
SAN JOSE, Calif., February 3, 2009 — SVTC Technologies (www.svtc.com) today announced a partnership with Entrepix, Inc., (www.entrepix.com) to provide 300 mm chemical mechanical polishing (CMP) ...
PHOENIX, ARIZ.& HSINCHU, TAIWAN: Rohm and Haas Electronic Materials, CMP Technologies, a leader and innovator in chemical mechanical planarization technology for the global semiconductor industry, ...
To allow real-time control of dielectric chemical mechanical planarization (CMP) processes to the 45 nm device node and beyond, Santa Clara, Calif.-based semiconductor manufacturing equipment leader ...
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