1K views · 48 reactions | ASML San Diego, located in California, is the epicenter for the development and manufacturing of DUV and EUV light sources for lithography systems. We are constantly pushing the boundaries of science, business, and technology. In the video below, learn more about how the brightest minds in mechanical, electrical, software, sourcing & supply chain and manufacturing bring it all together. | ASML | Facebook
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1K views · 48 reactions | ASML San Diego, located in California, is the …
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29 reactions | DUV is the backbone of chip manufacturing, so it's worth taking a closer look at this constantly evolving technology. Over the next few weeks we'll take you on a DUV deep dive - stay tuned! | ASML | Facebook
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29 reactions | DUV is the backbone of chip manufacturing, so it's wort…
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ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
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12K views · 774 reactions | China has successfully developed a brand-new DUV lithography technology capable of producing 3nm chips, which is completely different from ASML's. | Artificial Intelligence News | Facebook
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12K views · 774 reactions | China has successfully developed a bra…
101.6K views3 weeks ago
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DUV lithography: Advanced lithographic equipment is using low w... | Filo
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【ASML 週報 | DUV 微影系統持續創新中...🚀】 在半導體的世界裡，創新不一定來自最新問世的技術，有時候突破反而藏在那些經過時間淬鍊的系統裡✨ 我們的 DUV 深紫外光微影系統，就像默默耕耘、不斷精進的技術職人，在每一次更新中挑戰極限、刷新表現！ ASML 積極發展極紫外光（EUV）微影系統的同時，也持續投入深紫外光（DUV）技術的進化。別忘了，成熟製程依然是驅動晶片製造、撐起市場需求，甚至改變你我生活的關鍵力量！ #DUV 機台在成熟製程中持續創新 ✨ 浸潤式微影（Immersion systems）：我們的 TWINSCAN NXT:2150i 配備 193 nm ArF 光源，還擁有 1.35 高數值孔徑（NA）。不只穩定精準，現在每小時還能處理多達 310 片晶圓，比上一代 NXT:2100 更快、更靈巧，對準和成像表現也全面升級，幫助客戶降低製程複雜度、提高效率 💡 🌬️ 乾式微影（Dry systems）：不是每一層晶片都需要超高規格的浸潤技術，有時候「穩定發揮」才是關鍵！像是 XT:400M，就是在前代 XT:400L 基礎上再升級，不但支援 200mm
【ASML 週報 | DUV 微影系統持續創新中...🚀】 在半導體的世界裡，創新不 …
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It’s as fast as, well, lightning. See how light is created in our DUV lithography machines, but watch out – blink and you’ll miss it. | ASML
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